IT, Ubiquitous network
Lower energy-consuming LED; substrates and EL (electroluminescent) chemicals required for LED production; positive and negative electrodes, separator, and electrolyte of reusable lithium-ion battery… the Mitsubishi Chemical offers essential components for a “KAITEKI” (friendly and comfortable) products for the earth in IT fields.
- ■ IT, Ubiquitous network products
- Ethylene Carbonate
- High Purity Ethylene Carbonate
- GS Pla™
- GaN Wafer (GaN substrate)
- Epitaxial wafer for Light Emitting Diode
- Post Cu/Low-k CMP Cleaning Solution, "MCX-SDR4"
- Star Series
- Multifunctional Advanced Cleaning Solution, "AM1"
- Advanced Cleaning Solution for RCA Process, "MC1"
- High Performance Wet Etchant for Semiconductor/FPD Industries
- MPG(natural graphite-based) / ICG(artificial graphite-based)
- MITSUBISHI™ Carbon Black
As ethylene carbonate is a highly polar solvent and dissolves large amount of electrolyte, it is mainly used in lithium batteries electrolyte solution. It can also readily dissolve polymers leading to use as a release agent and detergent. Our product is high quality with low impurity levels and low moisture. It has earned an excellent reputation for adherence to the strict quality standards demanded by our customers. CAS: No.96-49-1 EINECS: No.202-510-0 Japan, Chemical Substances Control Law: METI-No. 5－523
High Purity Ethylene Carbonate. As ethylene carbonate is a highly polar solvent and dissolves large amount of electrolyte, it is mainly used in lithium batteries electrolyte solution. It can also readily dissolve polymers leading to use as a release agent and detergent. Our product is high quality with low impurity levels and low moisture. It has earned an excellent reputation for adherence to the strict quality standards demanded by our customers. CAS: No.96-49-1 EINECS: No.202-510-0 Japan, Chemical Substances Control Law: METI-No. 5－523
GS Pla™ has been developed and sold taking advantage of the biodegradable feature, and practical use is progressing to materials for agriculture, such as a biodegradable mulching film, as well as the material of disposable food utensils, etc. The tableware using GS Pla™ was used in the athletes' dormitories at the Vancouver Winter Olympics held in Canada in 2010. Furthermore, Thailand's Ko Samet resort island in July 2010 started to use GS Pla™ garbage bags as part of a garbage composting program. Now, a program is underway to convert one of the raw materials for GS Pla™, succinic acid, from petroleum origination to biomass origination.
Gallium Nitride is one kind of wide-gap compound semiconductors. CAS No.25617-97-4, EINECS Number 247-129-0 Mitsubishi Chemical's Gallium Nitride (GaN) substrate is a high-quality single-crystal substrate. It is made with original HVPE method and wafer processing technology, which has been originally developed for many years. The features are high crystalline, good uniformity, and superior surface quality. GaN substrates are used for many kinds of applications, for white LED and LD(violet, blue and green) Furthermore, development has progressed for power and high frequency electronic device applications. In order to achieve higher quality and productivity, we have been developing the Liquid Phase growth process called SCAAT(SuperCritical Acidic Ammonia Technology) method.
Mitsubishi Chemical's Epitaxial Wafers for Light Emitting Diode are high-quality, high-value-added compound semiconductor substrates. The LED layered structures are epitaxially grown on a Gallium Arsenide or Gallium Phosphide substrate by HVPE( Hydride Vapor Phase Epitaxy) or LPE( Liquid Phase Epitaxy). The features are high intensity and highly uniform luminescent properties. Those substrates are used to make various LED's (infrared, red, yellow, and green).
Epitaxial Wafer for Light Emitting Diode
During the post CMP cleaning process in semiconductor manufacturing, it is important to remove organic residues and particles on Cu wires and Low-k films without damaging the substrate. Our product, MXC-SDR4, is a high-efficiency cleaning solution suited for semiconductor industries. Characteristics: -High efficiency particle removal -Removes organic residues effectively -Limits galvanic corrosion on Cu wire -Limits Low-k damage -Improves Low-k wetting properties
In recent years, the demand is increasing for high quality removal of particles and metals from small size semiconductor circuits during silicon wafer cleaning process. Star Series meets those demands with semiconductor process chemicals having metal impurity levels below 10ppt. Products: Sulfuric acid, Nitric acid, Hydrochloric acid, Acetic acid, Ammonia solution, Hydrogen peroxide, Isopropyl alcohol
AM1 is a high-performance electronic chemical solution used as an alternative RCA clean for batch and single wafer applications. It has the capability to remove both particles and metal impurities. Furthermore, it has superior performance for metal gate cleaning because it does not corrode silicon. Features: ・Single wafer cleaning (realize superior surface cleanliness in a short time) ・Metal gate cleaning (no corrosion of tungsten or silicon)
MC1 is an electronic chemical processing solution which is a high-performance alternative RCA clean. MC1 contributes to the customer`s total cost reduction, because it can remove both particles and metals, thus reducing the number of steps of RCA cleaning. Features: ・Reduction of metal contamination ・Prevention of cross contamination
This is an electronic chemical used in wet etching in semiconductor manufacturing. We are providing the next etching solutions needed by the industry. Si etchant, Al etchant, Cr etchant, Au etchant, Ag etchant
Regarding the jER™ (formerly Epikote™ *) epoxy resin, Mitsubishi Chemical is prepared to support our customers' needs quickly and flexibly. Our production is extremely fast because we have accumulated many years of research with epoxy products. Our manufacturing, sales, research, and development are tightly integrated to enable rapid response to the challenges our customers face. (*Epikote™ is a trademark of Momentive Specialty Chemicals)
jERCURE™ curing agents for epoxy resins are an abundant set of curing agents that cover the full range from low to high curing temperature with functional groups ranging from amine, mercaptan, and phenol to Lewis acid complex compounds. A curing agent can be chosen from this set to fit the application. There are water-based curing agents for water-based epoxy resins, too.
NMC05 and NMC07, cathode materials for lithium-ion batteries, are the ternary system of nickel, manganese and cobalt with the composition of Ni/Mn/Co=33/33/33 and 45/45/10, respectively. Reducing the expensive cobalt to 10% by our proprietary technology, NMC07 achieves the output power equivalent to NMC111 and the durability superior to NMC111.
Mitsubishi Chemical provides two types of anode materials for lithium-ion batteries: MPG, natural graphite-based materials and ICG, artificial graphite-based materials. MPG shows excellent performance under rapid charging and discharging cycles. ICG has large capacity with improved battery life.
MPG (natural graphite-based materials) / ICG (artificial graphite-based materials)
Sol-Rite™, formulated electrolytes in organic solvents, are mainly used for lithium-ion batteries. It is also used for primary lithium batteries and aluminum electrolytic capacitors. Functional additives in the formulation improve battery performance significantly. Sol-Rite™ is the trademark of Mitsubishi Chemical Corporation.
SEPALENT™, separators for lithium-ion batteries, are polypropylene (PP) micro-porous membranes. The three-dimensional micro-pore structure of SEPALENT™ improves safety, output, and lifetime of lithium-ion batteries. SEPALENT™ is the trademark of Mitsubishi Chemical Corporation and Mitsubishi Plastics, Inc.
MITSUBISHI™ Carbon Black is a black pigment that has been used in a wide range of fields such as newspaper ink, printing ink, colored resin, paint, toner, colored paper, India ink, and ceramics. Various grades of carbon blacks are available ranging from all- purpose grade to high-grade. In addition, our line of products includes industrial and environmentally-friendly carbon blacks. CAS No.1333-86-4 Carbon Black Association Handbook 3rd edition (Ref. 1) Carbon Black Association Annual Report No.61 (2011) (Ref. 2)